Veeco WaferStorm 3303 Automated Solvent Processor
- Single 300mm FOUP load port for high volume platform
- Stainless steel with mirror finish
- PC-based user interface with local data storage
- SOL-based database RAID drive for control system and data storage
- SECS/GEM software for host interface
- CO2 Fire suppression system for 90" frame
- IR detector, 120-degree viewing angle and Linear Heat Detector Wire
- UPS battery backup for PC
- 3-Color LED status light lower (red, yellow, green)
- ULPA Filter with Air Ionizer bar (Standard ESD level l)
- Load port-TDK with wafer mapping and RFID reader
- 200-mm adapter plate (Allows 200mm Cassette in place of 300mm FOUP)
Robotic wafer handler:
- vertical, rotary, two paddle axes
- additional paddle axis (2)
- vacuum paddles (4)
- wafer alignment with LED backlight, color camera, and PC image processing Handler cover drain
Station 1: Solvent Immersion 200/300mm (Fill by NMP Fresh Supply)
- Solvent immersion station, SS construction with 2-kW heater and vertical agitation
- Recirculation, While Knight pump with 9.0-µm and 0.1-µm filters
- Cooling coils to cool solvent prior to draining
- Heater-SS 3-kW, single path: 6kW total heat (2)
- DFR solvent strainer: Triple-Stage with automatic flush feature
Station 2: MLO Spin Process chamber with grip actuator and spindle motor
- Haler chamber with exhaust pressure, temperature and cover interlock sensors
- CCD camera for chamber monitoring and video archive with LED lighting
Spin chuck-200/300mm (Active Edge Grip, Stainless Steel)
- Dispense Arm 2 with dual-position feedback
- Dispense A: LPD stream (NMP Fresh or Recirculated, Heated)
- Dispense B: HPC Fan-spray (NMP Recirculated, Heated)
- Dispense C: HPC Needle-spray (NMP Recirculated, Heated)
- Continuous-duty 35:1 high-pressure pump and high-pressure filter
- Heater-SS 2-kW, single path (Dispense A)
- Heater-SS 2-kW, dual path (Dispense B&C)
- Dispense Arm 3 with dual-position feedback
- Dispense A: LPD stream (NMP Recirculated, Heated) Dispense B: High-velocity spray (NMP Recirculated, Heated)
- Shared Heater-SS 3-kW, single path
- Stationary wall-mounted dispenses with adjustable nozzles
- Wall-dispense nozzle: (NMP Recirculated or Fresh, Heated)
- Shared Heater-SS 3-kW, single path (Wall Dispense, Backside Rinse A&B)
- Backside dispenses with adjustable nozzles
- Backside nozzle-A&B: LPD Stream (NMP Recirculated or Fresh, Heated)
- Chamber rinse--6 nozzles (NMP Recirculated, Ambient)
- Drain diverter Teflon"' 3-way (NMP recirculation/Solvent drain)
Station 3: SRD Spin Process chamber with grip actuator and spindle motor
- Haler chamber with exhaust pressure, temperature and cover interlock sensors CCD camera with LED lighting
- 02 Monitoring system: High-flow N2 purge with 02 sensor integrated into the chamber exhaust
- Spin chuck-200/300mm (Active Edge Grip, Stainless Steel)
- Dispense Arm 2 with dual-position feedback
- Dispense A: LPD stream (IPA Ambient)
- Dispense B: High-velocity spray (IPA Ambient) - Dispense Arm 3 with dual-position feedback
- Dispense A: LPD stream (DIW, Ambient)
- Dispense Arm 4 with dual-position feedback
- N2 heated dispense-with programmable 400-W heater, 0.003-µm filter
- Stationary wall-mounted dispenses with adjustable nozzles
- Wall-dispense nozzle A: (IPA, Ambient) Backside dispenses with adjustable nozzles Backside nozzles-A&B: (IPA, Ambient)
- Chamber rinse--6 nozzles (IPA, Ambient)
- Drain diverter Teflon 3-way (IPA drain/Industrial drain)