ASML XT 1950 HI Lithography System
Asset # :
75802
Equipment Make:
ASML
Equipment Model:
XT 1950 HI
Type:
Lithography System
Wafer Size:
12"
Equipment Configuration:
- S/W : 5.1.0 B
- RH type : IRL (PPD2)
- WH type : SMIF type
- IL type : UNICOM / PUPICOM
- IL type : ALE / Smash / BALE
- Wafer Size : 12"
- Laser type : Cymer Laser (XLR 560 60W 6.0 kHz)
- Material / Chemical : Align
- Sub Proc : IMM (ArF)
- Includes HD
- RH type : IRL (PPD2)
- WH type : SMIF type
- IL type : UNICOM / PUPICOM
- IL type : ALE / Smash / BALE
- Wafer Size : 12"
- Laser type : Cymer Laser (XLR 560 60W 6.0 kHz)
- Material / Chemical : Align
- Sub Proc : IMM (ArF)
- Includes HD
Equipment Pictures:
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Added: January 2, 2024
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Views: 347