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Matrix 103 Etcher / Asher

Asset #: 82758

Make: Matrix

Model: 103

Wafer Sizes: 4, 5, 6 inch

Last Confirm Date: August 16, 2024

Matrix 103 Etcher / Asher, 4" to 6"
Plasma Power:
-RF 100-500 W Auto-tune
- 600 Watts maximum
- 13.56 MHz
Wafer :
- Round
< 4.5" square substrates
Cassette Platform:
- Fixed
Closed Loop Pressure Control:
- Butterfly Valve
- Capacitance Manometer
Latest Software Version / Overhead Time"
- 4.01 / 45 sec
Temperature Control of Wafer Chuck:
- Closed Loop
- Resistive
- Element Heated
- Flat Chuck
- Range: 100°C - 220°C (+5°C)
Plasma Chamber / Electrode Design:
- Showerhead / Multipoint Electrode
No Baffle
Baseplate Cooling
No Wafer Cooling Station
Process:
- Throughput; >25 WPH
- Process Gases: 02 & N2 Standard (3rd MFC optional)
Strip Rate (6" wafers, 1.2 μ 120°C baked resist):
>0.8 μ/min @ 220°C
Non-uniformity, 1 sigma:
- < 15%
Particulates added/ size:
- <0.10 / cm2 > 0.3mm
Min Vacuum Pump speed:
- 26 CFM
Reliability:
- Availability: > 85%
- MTBF: > 250 hours
- MTBA: > 24 hours
- MTTR: < 6 hours

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