Plasmatherm Versaline HDPCVD & ICP RIE Cluster System Sold
Asset # :
60779
Equipment Make:
Plasmatherm
Equipment Model:
Versaline
Type:
HDP-CVD & ICP-RIE Cluster System
Wafer Size:
8"
Equipment Configuration:
– Electrostatic chuck
– Temperature Management System (-40 to +40°C)
– HDPCVD Heated ICP Source w/medium-power RF pkg.
– HDPCVD Optical Emission Interferometry
– EndpointWorks 2.0 HDPCVD
– Etch, +10 to 180°C
– HDPCVD Dry backing pump (1,600L)
– Heated ICP
Equipment Pictures:
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Added: July 21, 2021
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Views: 371