Applied Materials 5200 Centura Dry Etch Cluster Tool Sold

3ea process chamber+clean, w/ RF supply cabinet containing:
– 1ea RFPP LF10A RF supply
– 1ea RFPP RF20R RF supply
– 3ea ENO IEM-12B3 RF generators
– Power supply cabinet, 208V, 60Hz, 139kVA
Includes:
– 4ea BOC Edwards QDP80 vacuum pumps
– 2ea BOC Edwards