Applied Materials Centura AP AdvantEdge G 5 Dry Etch
Asset # :
55348
Equipment Make:
Applied Materials
Equipment Model:
Centura AP AdvantEdge G 5
Type:
Dry Etch
Wafer Size:
12"
Equipment Configuration:
– Option system: AdvantEdge G 5 Plasma Chamber
– With 2 SMC INR-496-003D Chillers
– With 1 SMC INR-498-043A Chiller
– Handler System: FI Robot
– Main System: AMAT Centura
– Factory Interface: FOUP
– Handler System: MF Robot
Equipment Pictures:
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Added: October 9, 2020
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Views: 2016