SPTS / STS VPX Pegasus ICP Deep Reactive Ion Etch (DRIE) Sold

Asset # : 52718
Equipment Make: SPTS / STS
Equipment Model: VPX Pegasus ICP
Type: DRIE
Wafer Size: 8"
Equipment Configuration:

– Gasses: C 4 F 8, SF 6, O 2, Ar, N 2
– Material Etched in: Si, Oxide, Nitride
– Bosch Process
Equipment Pictures:
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SPTS / STS-VPX Pegasus ICP-Deep Reactive Ion Etch (DRIE)-52718 Refurbished

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SPTS / STS-VPX Pegasus ICP-Deep Reactive Ion Etch (DRIE)-52718

SPTS / STS-VPX Pegasus ICP-Deep Reactive Ion Etch (DRIE)-52718

SPTS / STS-VPX Pegasus ICP-Deep Reactive Ion Etch (DRIE)-52718

SPTS / STS-VPX Pegasus ICP-Deep Reactive Ion Etch (DRIE)-52718

SPTS / STS-VPX Pegasus ICP-Deep Reactive Ion Etch (DRIE)-52718

SPTS / STS-VPX Pegasus ICP-Deep Reactive Ion Etch (DRIE)-52718

SPTS / STS-VPX Pegasus ICP-Deep Reactive Ion Etch (DRIE)-52718

SPTS / STS-VPX Pegasus ICP-Deep Reactive Ion Etch (DRIE)-52718

SPTS / STS-VPX Pegasus ICP-Deep Reactive Ion Etch (DRIE)-52718

SPTS / STS-VPX Pegasus ICP-Deep Reactive Ion Etch (DRIE)-52718

SPTS / STS-VPX Pegasus ICP-Deep Reactive Ion Etch (DRIE)-52718

SPTS / STS-VPX Pegasus ICP-Deep Reactive Ion Etch (DRIE)-52718

SPTS / STS-VPX Pegasus ICP-Deep Reactive Ion Etch (DRIE)-52718

SPTS / STS-VPX Pegasus ICP-Deep Reactive Ion Etch (DRIE)-52718

SPTS / STS-VPX Pegasus ICP-Deep Reactive Ion Etch (DRIE)-52718

SPTS / STS-VPX Pegasus ICP-Deep Reactive Ion Etch (DRIE)-52718

SPTS / STS-VPX Pegasus ICP-Deep Reactive Ion Etch (DRIE)-52718

SPTS / STS-VPX Pegasus ICP-Deep Reactive Ion Etch (DRIE)-52718

SPTS / STS-VPX Pegasus ICP-Deep Reactive Ion Etch (DRIE)-52718

SPTS / STS-VPX Pegasus ICP-Deep Reactive Ion Etch (DRIE)-52718

SPTS / STS-VPX Pegasus ICP-Deep Reactive Ion Etch (DRIE)-52718

SPTS / STS-VPX Pegasus ICP-Deep Reactive Ion Etch (DRIE)-52718

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  • Added: October 9, 2020

  • Views: 1282

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