Applied Materials Centura II Etch System

Asset # : 75704
Equipment Make: Applied Materials
Equipment Model: Centura II
Type: Etcher
Wafer Size:
Equipment Configuration: - 2x DPS+ Poly Chambers (Chamber position A, B, 1 Oriend Chamber
- Load Lock: Wide Body Heated Robot: HP+
- Source Generator: Atlas 2012
- Bias Generator: ACG 6B
- RF Match: 0010-36308
- End Point: Monochrometor
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  • Added: December 19, 2023

  • Views: 87

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