Jeol JBX 5500 FS E beam Direct Write Lithography System
Asset # :
19729
Equipment Make:
Jeol
Equipment Model:
JBX 5500 FS
Type:
E-Beam Direct Write Lithography
Wafer Size:
4"
Equipment Configuration:
Electron-beam lithography system that employs spot-beam vector scanning for sub-micron and nano-lithography
Two selectable writing modes:
High-resolution writing mode (5th Lens mode) for nano-lithography
High-speed writing mode (4th Lens mode) for sub-mi
Two selectable writing modes:
High-resolution writing mode (5th Lens mode) for nano-lithography
High-speed writing mode (4th Lens mode) for sub-mi
Equipment Pictures:
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Added: February 7, 2023
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Views: 549